Semiconductor Manufacturing

Semiconductor manufacturing is an extremely complex process requiring thousands of precisely controlled steps. Since a majority of these steps utilize critical mixtures of gases, measuring and regulating them is key to consistency, quality and yield. An extensive range of Brooks Instrument solutions including mass flow controllers, pressure controllers, and more are utilized throughout the semiconductor manufacturing process to help ensure successful and profitable outcomes.

Examples of applications:

Annealing
CMP
Deposition
Diffusion
Epitaxy
Ion Implantation
Lithography
Precise control of gas delivery for liquid and solid precursors
Pressure-based mass flow controller provides more accurate gas flow control for ozone applications

BOOST PROCESS YIELDS & CONTROL WITH GP200 SERIES PRESSURE-BASED MFC

All of the performance. None of the limitations. For the most demanding semiconductor processes, Brooks Instrument offers the GP200 Series P-MFC: The GP200 Series significantly reduces measurement uncertainty with a novel sensor approach — an integrated assembly with one absolute pressure sensor in tandem with a true differential pressure (ΔP) sensor. Suitable for all process conditions, the GP200 offers precise and repeatable gas delivery, as well as a dramatic reduction in valve leak-bay that helps eliminate the first wafer effect.

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Pressure-based Mass Flow Controller Provides More Accurate Gas Flow Control for Ozone Applications

Ozone is a powerful oxidizer used in a wide variety of applications within semiconductor manufacturing. It can enable the production of many oxide compounds and complex structures with fast reaction rates, making it a practical choice for semiconductor manufacturing processes. However, thermal decomposition and low-pressure delivery make ozone a challenge to precisely control.

Alexandra Davila - 11/16/2022

Application Note

Precise Control of Gas Delivery for Liquid and Solid Precursors

The controlled delivery of vapor from a liquid or solid precursor is an essential requirement for Chemical Vapor Deposition (CVD), Metal Organic Vapor Deposition (MOCVD), and Atomic Layer Deposition (ALD) processes.